MRI contrast agents are materials used to improve the visibility of patient internal body structures in MRI (magnetic resonance imaging) diagnostic procedure.įor medical diagnostic equipment, MRI diagnostics, tomographic patient examination, medical diagnosis processes, modern medicine, and medical science projects design.Ĭontrast Media Injector MRI is a high quality, photo real 3d model that will enhance detail and realism to any of your rendering projects. Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.Contrast Media Injector MRI medical health care device used for MRI contrast agents injection into the body of the diagnosed patient. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology) Discipline Electronics Origin Inist-CNRS Database PASCAL INIST identifier 18243627 Solid state devices / 001D03F16 Imaging devices Pascal 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics.
ESCANER CONTRASTE SIMULATOR
Part 1, 243-251 ref : 8 ref CODEN PSISDG ISSN 0277-786X ISBN 0-8194-5853-8 Scientific domain Electronics Optics Physics Publisher SPIE, Bellingham, Wash Publication country United States Document type Conference Paper Language English Keyword (fr) Champ magnétique Contraste image Dipôle Eclairement Endommagement Espace phase Evaluation performance Fabrication microélectronique Fonction erreur Formation image Lithographie Masque déphasage Méthode immersion Pastille électronique Photolithographie Rugosité Scanneur Simulateur Keyword (en) Magnetic field Image contrast Dipole Illumination Damaging Phase space Performance evaluation Microelectronic fabrication Error function Imaging Lithography Phase shifting masks Immersion method Wafer Photolithography Roughness Scanner Simulator Keyword (es) Campo magnético Imagen contraste Dipolo Alumbrado Deterioración Espacio fase Evaluación prestación Fabricación microeléctrica Función error Formación imagen Litografía Método immersión Pastilla electrónica Fotolitografía Rugosidad Escáner Simulador Classification Pascal 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Proceedings of SPIE, the International Society for Optical Engineering. Conference (12 2005) Author (monograph) Komuro, Masanori (Editor) Society of photo-optical instrumentation engineers, United States (Organiser of meeting) Source IMEC, KapeldrLeuven, Belgium Conference title Photomask and next-generation lithography mask technology XII (13-15 April 2005, Yokohama, Japan) Conference name Photomask and next-generation lithography mask technology. Sony Corporation, 4-14-1 Asahi- cho, Atsugi- shi, Kanagawa 243- 0014, Japan CopyPermanent link Copy Impact of the absorber thickness variation on the imaging performance of ArF immersion lithography Author YOSHIZAWA, Masaki 1 2 PHILIPSEN, Vicky 2 LEUNISSEN, Leonardus H.
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